If you're on a budget or have been troubled paying rented servers lately, then it's time to create your own dedicated server once and for all. Creating your own dedicated server can help you save up - not just from monthly bills - but with extra cost. Extra cost that is derived from extra services from your host company. Extra services which you can do on your own.
Server hosting also gives you the opportunity to make business out of it. Yes, if you have a computer - which is updated (recommended), a good router, and an unlimited internet connection, then your set to have your own dedicated server. You might also need to provide a network attached storage for data storage purposes.
By the way, how will I create income with it? You can create income by being the server instead of renting the server. You can start with small business server hosting. You can lease the extra space on your server to others. This is often called as virtual hosting.
What do I get when I start my own dedicated server? Aside from generating income, you will also have enough bandwidth for your business. You will have unlimited websites, storage, and databases. You will also personally monitor them 24/7. And freedom from paying bills.
Hosting a server is a great business nowadays. Businesses are starting to evolve. E-commerce is everywhere. And almost everybody has a website. Your market will be targeted on small scale and middle scale businesses. But it won't be long, you will become a competitor of your previous hosting company.
Although, there are major considerations when hosting a dedicated server. First, you will need to have a background of networking, scripting languages, and databases. You will need to manage all the processes involve in a server hosting business. But don't worry about that, there are lots of schools offering such courses, and no later in time, you will hire specialists to do the work for you.
You can also engage in business with email host providers. Or be an email host provider instead. Perhaps, that could also be an added feature for your hosting services.
As you can see, there are good things you can get from hosting your own server. Aside from the money, you are in control of all data. Plus, you can utilize your extra computers to expand your network. You can earn up from $ 300 to $ 500 dollars a month with just one customer. Of course, that's less the extra services like 24/7 monitoring, higher-type of security, and extra email service.
And come to think of it, you will have no problems expanding your other business online since you own all the space. And who knows, Google might find your hosting business competitive and feasible? Who knows they might do business with you.
If you have enough capital and equipments right now, why don't you start hosting your own server today? Don't worry about the technical requirements for now. Just think of how much money and influence you can acquire from hosting your own dedicated server.
Find out more how to start your small business server hosting for free. Razon L. Quin is an e-commerce consultant and affiliated with giant email hosts providers.
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Showing posts with label Small. Show all posts
Showing posts with label Small. Show all posts
Monday, June 25, 2012
Saturday, June 23, 2012
Advantages Of Small Chamber Confocal Sputtering Equipment For Research And Development
One popular method of Physical Vapor Deposition (PVD) is Sputtering, which has numerous product applications. Whereas commercial Sputter systems are often geared to large scale production volume of established processes, there is also a need for smaller scale sputtering systems for research and development where versatility is generally more important than volume throughput. These same smaller sputtering systems can also serve for lower volume initial production.
This paper will discuss some of the features and capabilities that can be available in smaller Sputter systems geared to low volume work such as research and development, in particular the use of a confocal arrangement of multiple targets around the perimeter of a circular rotating substrate stage, all angled in toward it.
Smaller chamber size has advantages of lower cost and smaller laboratory footprint, and the use of small circular cathodes also limits the investment required for target materials. At today's prices, a large gold target may cost nearly as much as the piece of equipment. Also, those small circular cathodes, available commercially from several sources, almost always have clamp on targets, making target material changes fast and easy and making it practical to be able to own and utilize targets of numerous different materials to support development work on many fronts.
It is possible to configure such a system in any desired orientation, for sputter down, sputter up, or sputter horizontally. This full tri axis capability can utilize any desired pumping configuration such as cryo or turbo. It is also possible to have just a simple single chamber, to be fully vented for loading and unloading, or to add either a manual or mechanized transfer arm load lock.
One key configuration element for maximal versatility is a rotating substrate stage centered within a ring of cathodes such that they are all angled in toward it in a confocal arrangement giving each the ability to provide adequate deposition coverage across the entire stage surface as it rotates, giving acceptable uniformity on the substrate or substrates. With adequate power supplies and controls, these cathodes can be fired individually or can be fired two (or more) at a time for co-deposition.
Any desired type(s) and quantity of cathode power supplies can be used, such as RF, DC, or pulsed DC. But these power supplies will be smaller than the ones required for large high volume tools, and thus less expensive, and the lower power cathodes reduce the demand for such facility support as total electrical power required or cooling water required.
Gas systems can include multiple gas channels, as would be desired for reactive sputtering, and can have either upstream or downstream pressure control as desired.
Another feature that can add to the total versatility for experimentation and process development is to have substrate stage temperature capability. Most commonly this is a stage heater, but some degree of cooling, while a bit more involved, is also possible. Such optional things as substrate bias can also be done, as well as features such as sputter etch or ion beam.
The number of cathodes, as well as their physical position and orientation, can be fixed - the lowest cost option - or can have some degree of mechanical adjustment capability such as angle or distance.
Obviously, adding more cathodes will force a somewhat larger chamber, and each additional cathode or power supply or other feature mentioned above carries some cost elements,. But if the features are needed, they are needed, whether in a smaller platform or a larger system. In general, any feature that could be put in a large system could be put in a small one.
Adding features to the smaller sputtering system will undoubtedly cost less than adding the same features to a larger, higher throughput system. This smaller chamber, confocal cathode array approach remains a viable way to have all the features you need at a lower cost than most other approaches to configuring a sputtering system to support development work, whether in a commercial facility or a university laboratory.
Author Norm Hardy's a Process Engineer at Semicore, a worldwide supplier of high performance Physical Vapor Deposition PVD coatings on a variety of materials. To find out more about Semicore's PVD Coating Equipment, and magnetron sputtering systems please visit our website http://www.semicore.com/sputtering-systems
View the original article here
This paper will discuss some of the features and capabilities that can be available in smaller Sputter systems geared to low volume work such as research and development, in particular the use of a confocal arrangement of multiple targets around the perimeter of a circular rotating substrate stage, all angled in toward it.
Smaller chamber size has advantages of lower cost and smaller laboratory footprint, and the use of small circular cathodes also limits the investment required for target materials. At today's prices, a large gold target may cost nearly as much as the piece of equipment. Also, those small circular cathodes, available commercially from several sources, almost always have clamp on targets, making target material changes fast and easy and making it practical to be able to own and utilize targets of numerous different materials to support development work on many fronts.
It is possible to configure such a system in any desired orientation, for sputter down, sputter up, or sputter horizontally. This full tri axis capability can utilize any desired pumping configuration such as cryo or turbo. It is also possible to have just a simple single chamber, to be fully vented for loading and unloading, or to add either a manual or mechanized transfer arm load lock.
One key configuration element for maximal versatility is a rotating substrate stage centered within a ring of cathodes such that they are all angled in toward it in a confocal arrangement giving each the ability to provide adequate deposition coverage across the entire stage surface as it rotates, giving acceptable uniformity on the substrate or substrates. With adequate power supplies and controls, these cathodes can be fired individually or can be fired two (or more) at a time for co-deposition.
Any desired type(s) and quantity of cathode power supplies can be used, such as RF, DC, or pulsed DC. But these power supplies will be smaller than the ones required for large high volume tools, and thus less expensive, and the lower power cathodes reduce the demand for such facility support as total electrical power required or cooling water required.
Gas systems can include multiple gas channels, as would be desired for reactive sputtering, and can have either upstream or downstream pressure control as desired.
Another feature that can add to the total versatility for experimentation and process development is to have substrate stage temperature capability. Most commonly this is a stage heater, but some degree of cooling, while a bit more involved, is also possible. Such optional things as substrate bias can also be done, as well as features such as sputter etch or ion beam.
The number of cathodes, as well as their physical position and orientation, can be fixed - the lowest cost option - or can have some degree of mechanical adjustment capability such as angle or distance.
Obviously, adding more cathodes will force a somewhat larger chamber, and each additional cathode or power supply or other feature mentioned above carries some cost elements,. But if the features are needed, they are needed, whether in a smaller platform or a larger system. In general, any feature that could be put in a large system could be put in a small one.
Adding features to the smaller sputtering system will undoubtedly cost less than adding the same features to a larger, higher throughput system. This smaller chamber, confocal cathode array approach remains a viable way to have all the features you need at a lower cost than most other approaches to configuring a sputtering system to support development work, whether in a commercial facility or a university laboratory.
Author Norm Hardy's a Process Engineer at Semicore, a worldwide supplier of high performance Physical Vapor Deposition PVD coatings on a variety of materials. To find out more about Semicore's PVD Coating Equipment, and magnetron sputtering systems please visit our website http://www.semicore.com/sputtering-systems
View the original article here
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